{"id":148,"date":"2026-08-15T11:52:00","date_gmt":"2026-08-15T11:52:00","guid":{"rendered":"https:\/\/gk5l0g06kd.onrocket.site\/?post_type=application&p=148"},"modified":"2026-09-14T09:45:53","modified_gmt":"2026-09-14T09:45:53","slug":"metrology","status":"publish","type":"application","link":"https:\/\/www.prior.com\/ja\/applications\/metrology\/","title":{"rendered":"Metrology Automation"},"content":{"rendered":"
Home<\/a><\/span> \u00bb Applications<\/a><\/span> \u00bb Metrology Automation<\/span><\/span><\/div>\n\n
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Metrology Automation Applications<\/h1>\n\n\n\n

Precise, sub-nanometer measurements for industry, life science, and drug discovery<\/h2>\n\n\n\n

Microscopy-based metrology relies on high performance movement coupled with high quality optics. Characterization and measurements of components is crucial for manufacturing, and can be performed in numerous ways depending on the microscope and sample type.<\/p>\n\n\n\n

Contrast based information can be used to determine topography depending on focus. Closed-loop stage movements help precisely determine the relative lateral position of objects. High-end microscopy techniques, such as atomic force microscopy, can apply these principles under extremely high-resolution conditions, producing accurate measurements even at picometer scale.<\/p>\n\n\n\n

Error analysis and compliance<\/h2>\n\n\n\n

Metrology allows determination of compliance, either to an industrial standard or to a design specification. Deviation from either allows the sample to be classified as correct, or provides statistical data that an error has occurred. Various measurements are possible with a metrology microscope, including:<\/p>\n\n\n\n

Surface analysis: <\/strong>sub-nanometer roughness and waviness measurements can be taken using atomic force microscopy or electron microscopy, <\/strong>with measurements in the low nanometer scale achievable with confocal microscopy or white light interferometry in combination with high performance microscopy automation.<\/p>\n\n\n\n

3D measurement:<\/strong> topographic profiles of objects with low micron resolution can be produced using conventional microscope optics in combination with automation, with higher resolutions accessible via AFM, electron microscopy or other methods.<\/p>\n\n\n\n

Feature identification: <\/strong>at lower resolutions imaging method can have a large impact on the quality of measurements. Darkfield illumination or differential interference contrast (DIC) can be used to identify specific features not easily identified using standard brightfield microscopy.<\/p>\n\n\n\n

Closed loop automation from microscopy experts<\/h2>\n\n\n\n

We have 40 years’ experience in manufacturing microscope automation components, from conventional compound microscope enhancements to market leading nanopositioning technology.<\/p>\n\n\n\n

High quality linear encoding and extensive test procedures ensure our ProScan III stage systems perform to the standards required for sub-micron resolution microscopy.<\/p>\n\n\n\n

Our Queensgate nanopositioning technology<\/a> is underpinned by capacitive sensors and low noise electronics, enabling picometer-scale measurements. Our products, such as the NPS-XY-100A<\/a> are proven complements to high-end microscopy techniques such as AFM.<\/p>\n\n\n\n

The NPS-X-60D and NPS-X-100D high-load nanopositioning stages<\/a> were designed to precisely position and hold heavy optical assemblies used for semiconductor inspection. <\/p>\n\n\n\n

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